[계명대] Microprocessor Fabrication 디자인 프로젝트
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작성일 19-10-19 22:23
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Download : [계명대] Microprocessor Fabrication 디자인 프로젝트.docx
설명
[계명대] Microprocessor Fabrication 디자인 프로젝트
1. Background introduction
Physical vapor deposition (PVD) describes a variety of vacuum deposition methods which can be used to produce thin films. PVD uses physical process (such as heating or sputtering) to produce a vapor of material, which is then deposited on the object which requires coating. PVD is used in the manufacture of items which require thin films for mechanical, optical, chemical or electronic functions. Examples include semiconductor devices such as thin film solar panels, aluminized PET film for food packaging and balloons, and coated cutting tools for metalworking. Besides PVD tools for fabrication, special smaller tools (mainly for scientific purposes) have been developed.
Common industrial coatings applied by PVD are titanium nitride, zirconium nitride, chromium nitride, titanium aluminum nitride.
The source material is unavoidably also deposited on most other surfaces interior to the vacuum chamber, including the fixturing used to hold the parts.
2. P…(To be continued )
순서
[계명대] Microprocessor Fabrication 디자인 프로젝트
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